Energetic Ion Implantation and Characterization studies

One of the unique facilities available at Ohio University is a 5 megavolt Tandem an de Graff particle accelerator. This facility, with its high beam intensities and pulsing capabilities, is being used to characterize and modify a variety of materials for condensed matter and surface sciences studies. The ability to detect scattered ions off materials allows for high-precision studies of their composition matched by few other techniques. Also, ion implantation and microscopically-controlled damage provide a host of possible engineered materials through the modification of the parent-material properties. This is a primary activity of Professor Ingram. For example, the Ohio University accelerator has been used in the modification of superconductors to study flux trapping effects. Rutherford backscattering (RBS) and proton induced X-ray analysis (PIXE) of glasses and superconductors are currently being performed to determin their atomic compositions and to aid in improving fabrication techniques. The capability to perform heavy ion elastic recoil detection analysis (ERDA), nuclear reaction analysis (NRA), and ion implantation and channeling is being developed to reach materials in ultra-high vacuum chambers, opening a promising new area of research.   Associated Faculty: Ingram