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Departmental Facilities (Equipment)
- A general purpose JOEL-2300 scanning electron microscope (SEM)
with a Link Systems energy dispersive x-ray (EDX) analysis system for
elemental identification.
- An ultra high vacuum surface science facility that includes; a VG
CLAM-2 X-ray photoelectron spectrometer (XPS); a scanning electron
gun for scanning Auger microprobe (SAM) analysis in conjunction
with the CLAM-2 spectrometer; electron gun and optics for low
energy electron diffraction (LEED); a residual gas analyzer; a
photo emission electron microscope (PEEM); a supersonic molecular
beam source. The vacuum in this system is maintained by ion pumps
and samples may be transferred from atmosphere via a turbo
molecular pumped load lock, which may also be used for sample
preparation.
- A ultra high vacuum low energy electron microscope (LEEM) that
also includes a deuterium lamp for PEEM, an SVT Associates atomic
nitrogen source and a residual gas analyzer.
- A high resolution electron energy loss spectroscopy (HREELS)
system with Leybold EL-22 HREELS optics, a low energy electron
diffraction
(LEED) system, residual gas analyzer and manipulator for in
situ tribology research. This is all housed in an ion pumped ultra
high vacuum system.
- An ambient atmosphere NanoScope II scanning tunneling
microscope (STM) and associated electronics.
- A Rigaku DIMAX-B x-ray powder diffractometer with a theta-theta
goniometer and computer automated data acquisition and analysis system.
- A EGG PARC 4500 computer controlled vibrating sample magnetometer
with duplex refrigerator for magnetic moment measurements from 15 K to
room temperature in fields up to 0.2 T.
- A duplex refrigerator-based heat capacity apparatus
for computer atutomated measurements from 20 K and up.
- Computer automated duplex refrigerator-based resistance
measurement apparatus from 15 K and up.
- Controlled atmosphere glove box for handling air-sensitive
materials; computer-controlled dual-zone furnaces for materials
preparation.
- He evaporator for measurements of thermal and transport
properties to 0.3 K in superconducting magnetic fields up to 5 T.
- Through ongoing collaborations, we have the use of thermal
and cold neutron scattering facilities at NIST, ORNL, and ILL at Grenoble.
We also make use of intense photon sources at the Wisconsin Synchrotron,
for the analysis of materials properties.
- An ultra high vacuum sputter deposition system for the growth of
epitaxial multilayers thin films.
- One of the beam lines from the 4.5 MV tandem Van de Graaff
accelerator on campus leads to the W. M. Keck Thin Film Analysis
Facility--an integrated ultra high vacuum (UHV) thin film deposition
and characterization facility. Permits Rutherford Backscattering
Spectroscopy (RBS), Nuclear Reaction Analysis (NRA), Elastic Recoil
Spectroscopy (ERS) and Proton-Induced X-Ray Emission (PIXE) under UHV
conditions.
Last modified on 11/21/2002
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