Fan Jiang is a condensed matter experimentalist who worked on
hydrogen-related defects in semiconductor materials by using infrared
absorption spectroscopy when she was a Ph.D. student at Lehigh
University. Her recent research interest has been focused on the thin
film epitaxy growth of III-nitrides (e.g. InGaN and InN) by
metal-organic chemical vapor deposition (MOCVD). III-nitrides are very
important materials for the next-generation general illumination (such as
white LED's) as well as many optoelectronic devices. Before she joined
Ohio University, she spent two and a half years at the Argonne National
Laboratory, looking at how III-nitrides grow with the ultra-bright
synchrotron photons at the Advanced Photon Source.
Fan enjoys hiking and traveling when she gets a chance. She also loves reading the Wall Street Journal everyday.
